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High-purity Molybdenum Planar Target and Rotary Target

For flat panel displays, sputtering targets are mainly used in the production of display panels and touch screen panels. The main types of targets used include molybdenum targets, aluminum targets, aluminum alloy targets, chromium targets, copper targets, copper alloy targets, silicon targets, titanium targets, niobium targets and indium-tin oxide (ITO) targets.

Product Description

產(chǎn)品用途：高純鉬平面靶材和旋轉(zhuǎn)靶材主要應(yīng)用于TFT-LCD制造中的柵極和源/漏電極。

Application:

High- purity molybdenum planar and rotary targets are mainly used in electrode gates and source / drain electrodes in TFT-LCD manufacturing.

產(chǎn)品性能參數(shù)/Product Property Parameters：

化學(xué)成分 Chemical Compositions
主含量，（%，不小于） Main Content, %, min	Mo	99.95	99.97
雜質(zhì)含量（質(zhì)量分?jǐn)?shù)），（%，不大于） Impurity Content (mass fraction), %, max	Al	0.0050	0.0010
	Ca	0.0020	0.0020
	Cr	0.0100	0.0020
	Cu	0.0020	0.0020
	Fe	0.0050	0.0020
	K	-	0.0020
	Mg	0.0020	0.0010
	Na	-	0.0010
	Ni	0.0050	0.0010
	Si	0.0050	0.0020
	W	0.0300	0.0300
	S	0.0050	-
	Cd	0.0001	-
	C	0.0100	0.0030
	O	0.0080	0.0040
	N	0.0030	0.0010
注：鉬含量為100%減去表中所列雜質(zhì)元素實(shí)測(cè)含量的總和（不包含氣體元素）；需方如有特殊要求時(shí)，由供需雙方協(xié)商確定，并在合同（或訂貨單）中注明。 Note: Molybdenum content is the sum of 100% minus the measured content of impurity elements listed in the table (excluding gas elements). Special requirements will be agreed upon by the supplier and buyer, and indicated in the contract or purchase order.

其他性能Other Properties:

牌號(hào)

Grade

密度

Density

(g/cm3)

平均晶粒尺寸Average Grain Size (um)

粗糙度Roughness (um)

平面度

Flatness

(mm)

貼合率Bonding Rate

≥10.15

≤100

≤0.8

≤0.30

≥98%

尺寸Size:

形狀Shape	產(chǎn)品世代	靶材尺寸（mm）
平面Planar	G2.5	7106308
	G 4.5	1200113012
	G5	1700143112
	G5.5	1950158016
	G6	2300180014
	G6	230019016
	G8.5	265021018
	G10.5	343020020
旋轉(zhuǎn)Rotary	G6	φ135/167*2158
旋轉(zhuǎn)Rotary	G8.5	φ135/167*2692